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ISO/TR 15969:2021

Current Revision

Surface chemical analysis - Depth profiling - Measurement of sputtered depth

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This document provides guidelines for measuring the sputtered depth in sputtered depth profiling. 

The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.


SDO ISO: International Organization for Standardization
Document Number ISO/TR 15969
Publication Date Not Available
Language en - English
Page Count
Revision Level
Supercedes
Committee ISO/TC 201/SC 4
Publish Date Document Id Type View
Not Available ISO/TR 15969:2021 Revision