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ASTM F1513-99(2003)

Historical Revision

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)

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1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).

1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.

1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.


This specification sets purity grade levels, physical attributes, analytical methods, and packaging of three grades of pure unalloyed aluminum source materials for electronic thin film applications such as evaporation sources and sputtering targets. The impurity levels should be analyzed using the proposed method and should be within the specified range for each grade.


SDO ASTM: ASTM International
Document Number F1513
Publication Date Dec. 10, 1999
Language en - English
Page Count 2
Revision Level 99(2003)
Supercedes
Committee F01.17
Publish Date Document Id Type View
June 1, 2011 F1513-99R11 Revision
Dec. 10, 1999 F1513-99R03 Revision
Dec. 10, 1999 F1513-99 Revision