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ASTM F1367-98(2011)

Current Revision

Standard Specification for Chromium Sputtering Targets for Thin Film Applications

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1.1 This specification covers sputtering targets fabricated from chromium metal.

1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.


This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.


SDO ASTM: ASTM International
Document Number F1367
Publication Date June 1, 2011
Language en - English
Page Count 2
Revision Level 98(2011)
Supercedes
Committee F01.17
Publish Date Document Id Type View
June 1, 2011 F1367-98R11 Revision
Aug. 10, 1998 F1367-98 Revision
Aug. 10, 1998 F1367-98R03 Reaffirmation