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ASTM F1152-02

Historical Revision

Standard Test Method for Dimensions of Notches on Silicon Wafers

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This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits.

1.2 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


SDO ASTM: ASTM International
Document Number F1152
Publication Date Jan. 10, 2002
Language en - English
Page Count 4
Revision Level 02
Supercedes
Committee F01.06
Publish Date Document Id Type View
Jan. 10, 2002 F1152-93 Revision
Jan. 10, 2002 F1152-02 Revision
Jan. 10, 2002 F1152-93R01 Reaffirmation