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ASTM E2245-11

Historical Revision

Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer (Withdrawn 2023)

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1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


Residual strain measurements are an aid in the design and fabrication of MEMS devices. The value for residual strain is used in Young’modulus calculations.

SDO ASTM: ASTM International
Document Number E2245
Publication Date Nov. 1, 2011
Language en - English
Page Count 24
Revision Level 11
Supercedes
Committee E08.05
Publish Date Document Id Type View
May 1, 2018 E2245-11R18 Revision
Nov. 1, 2011 E2245-11E01 Revision
Nov. 1, 2011 E2245-11 Revision
Nov. 1, 2005 E2245-05 Revision
Oct. 10, 2002 E2245-02 Revision