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ASTM E1577-11

Current Revision

Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis (Withdrawn 2020)

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1.1 This guide covers the information needed to characterize ion beams used in surface analysis.

1.2 This guide does not cover all information required to perform a sputter depth profile (see referenced documents), specify any properties of the specimen except its surface normal, and discuss the rationale for choosing a particular set of ion beam parameters (1,7). This guide does assume that the ion flux has a unique direction, that is, is an ion beam, rather than a wide spectrum of velocity vectors more typical of a plasma.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


Ion beams are utilized in surface analysis in two ways. First, they can generate signals from the specimen, for example, in SIMS and ISS. Second, they can remove material from the specimen surface while a surface analytical technique determines the composition of the freshly exposed surface. This process is called sputter depth profiling. Ideally, this guide requires reporting all characteristics of the ion beam that can possibly affect the results so that the measurement can be reproduced.

SDO ASTM: ASTM International
Document Number E1577
Publication Date May 1, 2011
Language en - English
Page Count 3
Revision Level 11
Supercedes
Committee E42.08
Publish Date Document Id Type View
May 1, 2011 E1577-11 Revision
Nov. 1, 2004 E1577-04 Revision
April 10, 2000 E1577-95R00 Reaffirmation