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ASTM D5127-99

Historical Revision

Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

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1.1 This guide covers the recommendations for the purity of water suitable for use in the electronics and microelectronics industry for purposes such as the washing and rinsing of semiconductor components in cleaning and etching operations, making steam for oxidation of silicon surfaces, photomask preparation, luminescent material deposition, and similar applications relating to the development and fabrication of solid state, thin film, communication lasers, light emitting diodes, photodetector, printed circuit, memory, vacuum tube, or electrolytic devices.

1.2 The values stated in SI units are to be regarded as standard. The inch-pound units given in parentheses are for information only.

1.3 This standard does not purport to address the safety problems associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


SDO ASTM: ASTM International
Document Number D5127
Publication Date June 10, 1999
Language en - English
Page Count 5
Revision Level 99
Supercedes
Committee D19.02
Publish Date Document Id Type View
Jan. 1, 2013 D5127-13 Revision
June 15, 2012 D5127-12 Revision
April 15, 2007 D5127-07 Revision
June 10, 1999 D5127-99 Revision
Oct. 15, 2018 D5127-13R18 Reaffirmation