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ASTM D5127-07

Historical Revision

Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

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1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Six classifications of water are described, including water for line widths as low as 0.09 micron. In all cases, the recommendations are for water at the point of distribution (POD).

1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices.

1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D 1193 and Guide D 5196.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


SDO ASTM: ASTM International
Document Number D5127
Publication Date April 15, 2007
Language en - English
Page Count 5
Revision Level 07
Supercedes
Committee D19.02
Publish Date Document Id Type View
Jan. 1, 2013 D5127-13 Revision
June 15, 2012 D5127-12 Revision
April 15, 2007 D5127-07 Revision
June 10, 1999 D5127-99 Revision
Oct. 15, 2018 D5127-13R18 Reaffirmation